Invention Grant
US06824949B2 Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
失效
聚苯并恶唑前体，光致抗蚀剂溶液，聚苯并恶唑，以及制备聚苯并恶唑前体的方法
- Patent Title: Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
- Patent Title (中): 聚苯并恶唑前体，光致抗蚀剂溶液，聚苯并恶唑，以及制备聚苯并恶唑前体的方法
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Application No.: US10008796Application Date: 2001-11-13
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Publication No.: US06824949B2Publication Date: 2004-11-30
- Inventor: Jörg Haussmann , Gerhard Maier , Günter Schmid , Recai Sezi
- Applicant: Jörg Haussmann , Gerhard Maier , Günter Schmid , Recai Sezi
- Priority: DE10011604 20000310
- Main IPC: G03F7004
- IPC: G03F7004
Abstract:
There are disclosed polybenzoxazole precursors which can be processed by centrifugal techniques, which can be cyclized to polybenzoxazoles on substrates without difficulty, and which after cyclization to polybenzoxazoles exhibit a high temperature stability. In particular, these precursors and the polybenzoxazoles prepared from them possess high resistance against the diffusion of metals.
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