发明授权
- 专利标题: Hot carrier oxide qualification method
- 专利标题(中): 热载体氧化物鉴定方法
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申请号: US10165879申请日: 2002-06-10
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公开(公告)号: US06825684B1公开(公告)日: 2004-11-30
- 发明人: Hyeon-Seag Kim , Amit P. Marathe , Nian Yang , Tien-Chun Yang
- 申请人: Hyeon-Seag Kim , Amit P. Marathe , Nian Yang , Tien-Chun Yang
- 主分类号: G01R3100
- IPC分类号: G01R3100
摘要:
A method of generating a lifetime projection for semiconductor devices is disclosed. The disclosed method includes collecting lifetime information from a plurality of semiconductor devices at more than one stress condition. The method also includes determining the median lifetime for semiconductor devices at each of the stress conditions. Further, the method includes calculating a lifetime at each stress condition at which a predetermined percentage of the devices will exceed and extrapolating the lifetime for devices used at operating conditions.
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