发明授权
US06828593B2 Semiconductor light emitting element and its manufacturing method 有权
半导体发光元件及其制造方法

  • 专利标题: Semiconductor light emitting element and its manufacturing method
  • 专利标题(中): 半导体发光元件及其制造方法
  • 申请号: US10125289
    申请日: 2002-04-18
  • 公开(公告)号: US06828593B2
    公开(公告)日: 2004-12-07
  • 发明人: Hideto SugawaraMasayuki Ishikawa
  • 申请人: Hideto SugawaraMasayuki Ishikawa
  • 优先权: JP9-146263 19970604
  • 主分类号: H01L3300
  • IPC分类号: H01L3300
Semiconductor light emitting element and its manufacturing method
摘要:
When a plurality of semiconductor layers including a nitride compound layer containing indium are stacked on a substrate, materials of layers above the indium containing nitride compound layer are limited to specific compounds, or their growth temperatures are limited within a predetermined range, to suppress thermal deterioration of the nitride compound layer containing indium or deterioration of the interface and to thereby grow a high-quality semiconductor light emitting element using nitride compound semiconductors. When manufacturing a nitride compound semiconductor light emitting element having a first layer made of a first nitride compound semiconductor containing indium and a second layer stacked on the first layer, conditions for stacking the second layer are selected those inside a closed region defined by connecting points plotted at x and y coordinates (364, 600), (364, 1010), (550, 1010), (650, 600) and (364, 600) on a graph taking emission wavelengths based on band-to-band transition of the first layer in nanometer on the x axis and taking growth temperatures of the second layer in ° C. on the y axis. Thus, a high-performance light emitting element can be made without inviting thermal deterioration of the first layer.
信息查询
0/0