发明授权
- 专利标题： Resist composition and patterning process
- 专利标题（中）： 抗蚀剂组成和图案化工艺
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申请号： US10170345申请日： 2002-06-14
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公开(公告)号： US06830866B2公开(公告)日： 2004-12-14
- 发明人: Tomohiro Kobayashi , Tsunehiro Nishi , Satoshi Watanabe , Takeshi Kinsho , Shigehiro Nagura , Toshinobu Ishihara
- 申请人： Tomohiro Kobayashi , Tsunehiro Nishi , Satoshi Watanabe , Takeshi Kinsho , Shigehiro Nagura , Toshinobu Ishihara
- 优先权： JP2001-181079 20010615
- 主分类号： G03F7038
- IPC分类号： G03F7038
摘要：
A resist composition comprising a hydrogenated product of ring-opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance, and lends itself to micropatterning with electron beams or deep-UV.
公开/授权文献
- US20030013039A1 Resist composition and patterning process 公开/授权日：2003-01-16