发明授权
US06830867B2 Positive photosensitive composition 失效
正光敏组合物

  • 专利标题: Positive photosensitive composition
  • 专利标题(中): 正光敏组合物
  • 申请号: US10261655
    申请日: 2002-10-02
  • 公开(公告)号: US06830867B2
    公开(公告)日: 2004-12-14
  • 发明人: Kunihiko Kodama
  • 申请人: Kunihiko Kodama
  • 优先权: JPP.2001-307537 20011003
  • 主分类号: G03F7004
  • IPC分类号: G03F7004
Positive photosensitive composition
摘要:
A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.
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