发明授权
- 专利标题: Positive photosensitive composition
- 专利标题(中): 正光敏组合物
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申请号: US10261655申请日: 2002-10-02
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公开(公告)号: US06830867B2公开(公告)日: 2004-12-14
- 发明人: Kunihiko Kodama
- 申请人: Kunihiko Kodama
- 优先权: JPP.2001-307537 20011003
- 主分类号: G03F7004
- IPC分类号: G03F7004
摘要:
A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.
公开/授权文献
- US20030148206A1 Positive photosensitive composition 公开/授权日:2003-08-07
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