发明授权
- 专利标题： Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
- 专利标题（中）： 使用曝光装置制造微型装置的曝光装置和方法
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申请号： US09697639申请日： 2000-10-27
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公开(公告)号： US06833904B1公开(公告)日： 2004-12-21
- 发明人: Hideki Komatsuda
- 申请人： Hideki Komatsuda
- 优先权： JP10-047400 19980227; JP10-263673 19980917; JP2000-050137 20000225
- 主分类号： G03B2742
- IPC分类号： G03B2742
摘要：
A projection system projects a pattern formed on a mask onto a photosensitive substrate. An illumination optical system forms an illumination field at a position on the mask. A drive relatively moves the mask and the photosensitive substrate with respect to the projection system along a predetermined scanning exposure direction. A first illumination adjustment mechanism adjusts an illumination characteristic along the scanning exposure direction. A second illumination adjustment mechanism adjusts an illumination characteristic in a direction crossing the scanning exposure direction. A first telecentricity adjustment mechanism applies an inclined component to telecentricity. A second telecentricity adjustment mechanism adjusts the telecentricity relative to the position of an optical axis.