发明授权
US06835956B1 Nitride semiconductor device and manufacturing method thereof 失效
氮化物半导体器件及其制造方法

  • 专利标题: Nitride semiconductor device and manufacturing method thereof
  • 专利标题(中): 氮化物半导体器件及其制造方法
  • 申请号: US09500288
    申请日: 2000-02-08
  • 公开(公告)号: US06835956B1
    公开(公告)日: 2004-12-28
  • 发明人: Shinichi NagahamaShuji Nakamura
  • 申请人: Shinichi NagahamaShuji Nakamura
  • 优先权: JPP11-030990 19990209; JPP11-331797 19991122
  • 主分类号: H01L2715
  • IPC分类号: H01L2715
Nitride semiconductor device and manufacturing method thereof
摘要:
A nitride semiconductor device includes a GaN substrate having a single-crystal GaN layer at least on its surface and plurality of device-forming layers made of nitride semiconductor. The device-forming layer contacting the GaN substrate has a coefficient of thermal expansion smaller than that of GaN, so that a compressive strain is applied to the device-forming layer. This result in prevention of crack forming in the device-forming layers, and a lifetime characteristics of the nitride semiconductor device is improved.
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