发明授权
US06835970B2 Semiconductor device having self-aligned contact pads and method for manufacturing the same 有权
具有自对准接触焊盘的半导体器件及其制造方法

  • 专利标题: Semiconductor device having self-aligned contact pads and method for manufacturing the same
  • 专利标题(中): 具有自对准接触焊盘的半导体器件及其制造方法
  • 申请号: US10087063
    申请日: 2002-03-01
  • 公开(公告)号: US06835970B2
    公开(公告)日: 2004-12-28
  • 发明人: Dong-seok NamJi-soo KimYun-sook Chae
  • 申请人: Dong-seok NamJi-soo KimYun-sook Chae
  • 优先权: KR2001-48740 20000813
  • 主分类号: H01L2710
  • IPC分类号: H01L2710
Semiconductor device having self-aligned contact pads and method for manufacturing the same
摘要:
A semiconductor device having self-aligned contact pads and a method for manufacturing the same are provided. The semiconductor device includes a semiconductor substrate and an isolation layer formed on the semiconductor substrate. The semiconductor substrate defines a plurality of active regions that each have a major axis and a minor axis. A plurality of gates are formed to cross the plurality of active regions and extend in the direction of the minor axis. First and second source/drain regions are formed in active regions at either side of each of the gates. First and second self-aligned contact pads (SACs) are formed to contact the top surfaces of the first and second source/drain regions, respectively.
信息查询
0/0