Invention Grant
US06835970B2 Semiconductor device having self-aligned contact pads and method for manufacturing the same 有权
具有自对准接触焊盘的半导体器件及其制造方法

  • Patent Title: Semiconductor device having self-aligned contact pads and method for manufacturing the same
  • Patent Title (中): 具有自对准接触焊盘的半导体器件及其制造方法
  • Application No.: US10087063
    Application Date: 2002-03-01
  • Publication No.: US06835970B2
    Publication Date: 2004-12-28
  • Inventor: Dong-seok NamJi-soo KimYun-sook Chae
  • Applicant: Dong-seok NamJi-soo KimYun-sook Chae
  • Priority: KR2001-48740 20000813
  • Main IPC: H01L2710
  • IPC: H01L2710
Semiconductor device having self-aligned contact pads and method for manufacturing the same
Abstract:
A semiconductor device having self-aligned contact pads and a method for manufacturing the same are provided. The semiconductor device includes a semiconductor substrate and an isolation layer formed on the semiconductor substrate. The semiconductor substrate defines a plurality of active regions that each have a major axis and a minor axis. A plurality of gates are formed to cross the plurality of active regions and extend in the direction of the minor axis. First and second source/drain regions are formed in active regions at either side of each of the gates. First and second self-aligned contact pads (SACs) are formed to contact the top surfaces of the first and second source/drain regions, respectively.
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