发明授权
- 专利标题: Semiconductor device having self-aligned contact pads and method for manufacturing the same
- 专利标题(中): 具有自对准接触焊盘的半导体器件及其制造方法
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申请号: US10087063申请日: 2002-03-01
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公开(公告)号: US06835970B2公开(公告)日: 2004-12-28
- 发明人: Dong-seok Nam , Ji-soo Kim , Yun-sook Chae
- 申请人: Dong-seok Nam , Ji-soo Kim , Yun-sook Chae
- 优先权: KR2001-48740 20000813
- 主分类号: H01L2710
- IPC分类号: H01L2710
摘要:
A semiconductor device having self-aligned contact pads and a method for manufacturing the same are provided. The semiconductor device includes a semiconductor substrate and an isolation layer formed on the semiconductor substrate. The semiconductor substrate defines a plurality of active regions that each have a major axis and a minor axis. A plurality of gates are formed to cross the plurality of active regions and extend in the direction of the minor axis. First and second source/drain regions are formed in active regions at either side of each of the gates. First and second self-aligned contact pads (SACs) are formed to contact the top surfaces of the first and second source/drain regions, respectively.
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