Invention Grant
- Patent Title: Semiconductor device having self-aligned contact pads and method for manufacturing the same
- Patent Title (中): 具有自对准接触焊盘的半导体器件及其制造方法
-
Application No.: US10087063Application Date: 2002-03-01
-
Publication No.: US06835970B2Publication Date: 2004-12-28
- Inventor: Dong-seok Nam , Ji-soo Kim , Yun-sook Chae
- Applicant: Dong-seok Nam , Ji-soo Kim , Yun-sook Chae
- Priority: KR2001-48740 20000813
- Main IPC: H01L2710
- IPC: H01L2710

Abstract:
A semiconductor device having self-aligned contact pads and a method for manufacturing the same are provided. The semiconductor device includes a semiconductor substrate and an isolation layer formed on the semiconductor substrate. The semiconductor substrate defines a plurality of active regions that each have a major axis and a minor axis. A plurality of gates are formed to cross the plurality of active regions and extend in the direction of the minor axis. First and second source/drain regions are formed in active regions at either side of each of the gates. First and second self-aligned contact pads (SACs) are formed to contact the top surfaces of the first and second source/drain regions, respectively.
Public/Granted literature
- US20030032219A1 Semiconductor device having self-aligned contact pads and method for manufacturing the same Public/Granted day:2003-02-13
Information query