发明授权
- 专利标题： Chemical amplification, positive resist compositions
- 专利标题（中）： 化学放大，正光刻胶组合物
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申请号： US09799009申请日： 2001-03-06
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公开(公告)号： US06838224B2公开(公告)日： 2005-01-04
- 发明人: Youichi Ohsawa , Jun Watanabe , Takanobu Takeda , Akihiro Seki
- 申请人： Youichi Ohsawa , Jun Watanabe , Takanobu Takeda , Akihiro Seki
- 申请人地址： JP Tokyo
- 专利权人： Shi-Etsu Chemical Co., Ltd.
- 当前专利权人： Shi-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Millen, White, Zelano & Branigan, P.C.
- 优先权： JP2000-061357 20000307
- 主分类号： G03F7/028
- IPC分类号： G03F7/028 ; G03F7/039 ; G03C1/73
摘要：
A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH2)nOCH(CH2CH3)— wherein C6H11 is cyclohexyl and n=0 or 1. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.
公开/授权文献
- US20010033994A1 Chemical amplification, positive resist compositions 公开/授权日：2001-10-25