发明授权
- 专利标题: Chemical amplification, positive resist compositions
- 专利标题(中): 化学放大,正光刻胶组合物
-
申请号: US09799009申请日: 2001-03-06
-
公开(公告)号: US06838224B2公开(公告)日: 2005-01-04
- 发明人: Youichi Ohsawa , Jun Watanabe , Takanobu Takeda , Akihiro Seki
- 申请人: Youichi Ohsawa , Jun Watanabe , Takanobu Takeda , Akihiro Seki
- 申请人地址: JP Tokyo
- 专利权人: Shi-Etsu Chemical Co., Ltd.
- 当前专利权人: Shi-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Millen, White, Zelano & Branigan, P.C.
- 优先权: JP2000-061357 20000307
- 主分类号: G03F7/028
- IPC分类号: G03F7/028 ; G03F7/039 ; G03C1/73
摘要:
A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH2)nOCH(CH2CH3)— wherein C6H11 is cyclohexyl and n=0 or 1. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.
公开/授权文献
- US20010033994A1 Chemical amplification, positive resist compositions 公开/授权日:2001-10-25