发明授权
- 专利标题: Polystyrene as a resist for making patterned media
- 专利标题(中): 聚苯乙烯作为制作图案化介质的抗蚀剂
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申请号: US10112214申请日: 2002-03-29
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公开(公告)号: US06838227B2公开(公告)日: 2005-01-04
- 发明人: HongYing Wang , Neil Deeman , Koichi Wago , Nobuo Kurataka
- 申请人: HongYing Wang , Neil Deeman , Koichi Wago , Nobuo Kurataka
- 申请人地址: US CA Scotts Valley
- 专利权人: Seagate Technology LLC
- 当前专利权人: Seagate Technology LLC
- 当前专利权人地址: US CA Scotts Valley
- 代理商 Raghunath S. Minisandram; Jesus Del Castillo
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; G11B5/74 ; G11B5/82 ; G11B5/855 ; G03C5/00 ; B05D5/12 ; B32B13/04
摘要:
A system and method for forming servo patterns on magnetic media is disclosed. A magnetic film coated with a layer of polystyrene is stamped with a nickel stamper reproducing the negative image of the stamped pattern on the polystyrene. Ions are then accelerated towards the surface of the polystyrene, which stopps the ions in the areas where the polystyrene is thick and allows the ions to penetrate through to the magnetic layer in the areas where the polystyrene is thin. The ions, which penetrate through to the magnetic layer, interact with the magnetic layer altering the magnetic layer's structure reducing its coercivity (Hc) and remnant moment (Mrt). This reproduces the stamped polystyrene pattern on the magnetic layer. The polystyrene is then removed by oxygen plasma etching the surface leaving behind a patterned magnetic media.
公开/授权文献
- US20030104316A1 Polystyrene as a resist for making patterned media 公开/授权日:2003-06-05