发明授权
- 专利标题： Lithographic projection apparatus and particle barrier for use therein
- 专利标题（中）： 平版印刷设备和粒子屏障
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申请号： US10644954申请日： 2003-08-21
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公开(公告)号： US06838684B2公开(公告)日： 2005-01-04
- 发明人: Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans , Vadim Yevgenyevich Banine
- 申请人： Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans , Vadim Yevgenyevich Banine
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop LLP
- 优先权： EP02078515 20020823
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; G21G5/00
摘要：
A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.
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