发明授权
- 专利标题： Transfer apparatus and method for semiconductor process and semiconductor processing system
- 专利标题（中）： 半导体工艺和半导体处理系统的转移装置和方法
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申请号： US10467345申请日： 2002-01-23
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公开(公告)号： US06845292B2公开(公告)日： 2005-01-18
- 发明人: Lin Sha , Yicheng Li
- 申请人： Lin Sha , Yicheng Li
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2001-044249 20010220
- 国际申请： PCTJP02/00449 WO 20020123
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/31 ; H01L21/68 ; G06F17/00
摘要：
A transfer apparatus (42) for a semiconductor processing system includes a transfer member (44) having a support portion (48) to place a target substrate (W) thereon, and a drive unit (68) for driving the transfer member (44). A reference mark (54) is disposed adjacent to the support portion (48). The target substrate (W) has optically observable first and second portions (84, 86). A storage section (63) stores a normal image that shows a positional correlation between the reference mark (54) and the first and second portions (84, 86), obtained when the target substrate (W) is placed on the support portion (48) at a normal position. An image pick-up device (62A) takes a detection image that shows a positional correlation between the reference mark (54) and the first and second portions (84, 86), when the transfer member (44) transfers the target substrate (W). An information processing unit (62B) obtains a misalignment amount of the target substrate (W) relative to the normal position, based on the normal image and the detection image.