发明授权
- 专利标题: Article having predetermined surface shape and method for production thereof
- 专利标题(中): 具有预定表面形状的制品及其制造方法
-
申请号: US09959451申请日: 2001-02-21
-
公开(公告)号: US06849209B2公开(公告)日: 2005-02-01
- 发明人: Tsutomu Minami , Masahiro Tatsumisago , Kiyoharu Tadanaga , Atsunori Matsuda , Masahiro Hori , Koichiro Nakamura , Hiroaki Yamamoto
- 申请人: Tsutomu Minami , Masahiro Tatsumisago , Kiyoharu Tadanaga , Atsunori Matsuda , Masahiro Hori , Koichiro Nakamura , Hiroaki Yamamoto
- 申请人地址: JP Osaka JP Osaka
- 专利权人: Nippon Sheet Glass Co., Ltd.,Tsutomu Minami
- 当前专利权人: Nippon Sheet Glass Co., Ltd.,Tsutomu Minami
- 当前专利权人地址: JP Osaka JP Osaka
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2000-049387 20000225
- 国际申请: PCTJP01/01255 WO 20010221
- 国际公布: WO0162494 WO 20010830
- 主分类号: G02B1/04
- IPC分类号: G02B1/04 ; B05D1/18 ; B29C33/42 ; B29C37/00 ; B29C39/10 ; B29C43/18 ; B29C59/02 ; C03C17/30 ; C08G77/22 ; C08J5/00 ; C09D183/04 ; G02B3/00 ; B29D7/00 ; B32B3/30
摘要:
An article with a predetermined surface pattern that is coated with a film which makes possible the complete transfer of the pattern of a patterning die and thick-film patterning having a depth to the order of several tens of micrometers, prevents the occurrence of cracks, has high film hardness, and has a surface pattern which is the inverse of the surface pattern of the patterning die. This article is produced by joining a patterning die closely to a substrate with a sol-gel material containing the silane compound represented by the formula: R1SiX3 (wherein R1 is an alkyl group or hydrogen and X is an alkoxyl group or a halogen atom) and the silane compound represented by the formula: R2SiY3 (wherein R2 is an aryl group or a substituted aryl group and Y is an alkoxyl group or a halogen atom) disposed therebetween in the form of a film and heating them to coat the surface of the substrate with a gel film having a surface pattern which is the inverse of the surface pattern of the patterning die.