发明授权
- 专利标题： Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
- 专利标题（中）： 修复光掩模的方法，光掩模检查方法，光掩模的制造方法以及半导体装置的制造方法
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申请号： US09870702申请日： 2001-06-01
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公开(公告)号： US06849363B2公开(公告)日： 2005-02-01
- 发明人: Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
- 申请人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
- 申请人地址： JP Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Kawasaki
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP9-171695 19970627; JP10-201942 19980716
- 主分类号： G01N21/956
- IPC分类号： G01N21/956 ; G03F1/00 ; G03F1/84 ; G03F7/20 ; G03F9/00 ; G06K9/00
摘要：
A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.
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