- 专利标题: Electron beam device and method for stereoscopic measurements
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申请号: US10086625申请日: 2002-03-04
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公开(公告)号: US06852974B2公开(公告)日: 2005-02-08
- 发明人: Nobuo Kochi , Hirotami Koike
- 申请人: Nobuo Kochi , Hirotami Koike
- 申请人地址: JP Tokyo
- 专利权人: Topcon Corporation
- 当前专利权人: Topcon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Foley & Lardner LLP
- 优先权: JP2001-062686 20010306; JP2001-062687 20010306; JP2001-062688 20010306
- 主分类号: H01J37/26
- IPC分类号: H01J37/26 ; G01N23/00
摘要:
An electron beam device according to the present invention is made up of an electron beam source for emitting an electron beam, an electron optical system for irradiating the electron beam onto a specimen, a specimen holder for holding the specimen, a specimen tilting section for producing relative tilt angles between the specimen holder and the electron beam, an electron beam detecting section for detecting electron beam emitted from the specimen, and a data correcting section for correcting the three-dimensional detection data to have specified relationship under the condition of a relative tilt angle between the specimen holder and the electron beam.
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