发明授权
US06869884B2 Process to reduce substrate effects by forming channels under inductor devices and around analog blocks
失效
通过在电感器件和模拟块周围形成沟道来减少衬底效应的过程
- 专利标题: Process to reduce substrate effects by forming channels under inductor devices and around analog blocks
- 专利标题(中): 通过在电感器件和模拟块周围形成沟道来减少衬底效应的过程
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申请号: US10225828申请日: 2002-08-22
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公开(公告)号: US06869884B2公开(公告)日: 2005-03-22
- 发明人: Lap Chan , Sanford Chu , Chit Hwei Ng , Purakh Verma , Jia Zhen Zheng , Johnny Chew , Choon Beng Sia
- 申请人: Lap Chan , Sanford Chu , Chit Hwei Ng , Purakh Verma , Jia Zhen Zheng , Johnny Chew , Choon Beng Sia
- 申请人地址: SG Singapore
- 专利权人: Chartered Semiconductor Manufacturing Ltd.
- 当前专利权人: Chartered Semiconductor Manufacturing Ltd.
- 当前专利权人地址: SG Singapore
- 代理商 George O. Saile; Rosemary L.S. Pike; Stephen G. Stanton
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L21/265 ; H01L21/302 ; H01L21/461 ; H01L21/764
摘要:
A first method of reducing semiconductor device substrate effects comprising the following steps. O+ or O2+ are selectively implanted into a silicon substrate to form a silicon-damaged silicon oxide region. One or more devices are formed over the silicon substrate proximate the silicon-damaged silicon oxide region within at least one upper dielectric layer. A passivation layer is formed over the at least one upper dielectric layer. The passivation layer and the at least one upper dielectric layer are patterned to form a trench exposing a portion of the silicon substrate over the silicon-damaged silicon oxide region. The silicon-damaged silicon oxide region is selectively etched to form a channel continuous and contiguous with the trench whereby the channel reduces the substrate effects of the one or more semiconductor devices. A second method of reducing substrate effects under analog devices includes forming an analog device on a SOI substrate and then selectively etching the silicon oxide layer of the SOI substrate to form a channel at least partially underlying the analog device.