发明授权
- 专利标题： Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method
- 专利标题（中）： 电子光学系统阵列，其制造方法，带电粒子束曝光装置和器件制造方法
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申请号： US09819669申请日： 2001-03-29
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公开(公告)号： US06872950B2公开(公告)日： 2005-03-29
- 发明人: Yasuhiro Shimada , Takayuki Yagi , Haruhito Ono
- 申请人： Yasuhiro Shimada , Takayuki Yagi , Haruhito Ono
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2000-097067 20000331; JP2001-074736 20010315
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01J37/12 ; H01J37/305 ; H01J37/317 ; H01L21/027 ; H01J37/304
摘要：
This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrodes arranged along the paths of a plurality of charged-particle beams. Each of the plurality of electrodes has a membrane in which a plurality of apertures are formed on the paths of the plurality of charged-particle beams, and a support portion which supports the membrane. At least two of the plurality of electrodes are arranged to form a nested structure.
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