发明授权
- 专利标题: Noncontact measuring system for electrical conductivity
- 专利标题(中): 非接触式电导率测量系统
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申请号: US10441552申请日: 2003-05-20
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公开(公告)号: US06879167B2公开(公告)日: 2005-04-12
- 发明人: Yang Ju , Masumi Saka , Hiroyuki Abe
- 申请人: Yang Ju , Masumi Saka , Hiroyuki Abe
- 申请人地址: JP
- 专利权人: Tohoku Techno Arch Co., Ltd.
- 当前专利权人: Tohoku Techno Arch Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Hayes Soloway P.C.
- 优先权: JP2002-343833 20021127
- 主分类号: G01R27/02
- IPC分类号: G01R27/02 ; G01N22/00 ; G01N22/02 ; G01R27/06 ; G01R27/26 ; G01R31/311 ; H01L21/66 ; G01R27/04 ; G01R27/32
摘要:
The invention provides a noncontact measuring system for electrical conductivity, which uses a microwave. In the measuring system for electrical conductivity, the microwave generated in a network analyzer (NA) 110 is guided to a surface of a silicon wafer (sample) 160 through a waveguide 130 and a sensor 140. The surface of the silicon wafer 160 is irradiated with the microwave, and the sensor 140 receives the reflected microwave. The electrical conductivity of the silicon wafer 160 is measured in such a manner that a computer (personal computer) 120 calculates the electrical conductivity from an amplitude ratio A and phase difference θ to a reflected wave of the silicon wafer 160, which is determined with the network analyzer 110. The computer 120 performs not only the calculation of the measurement but also whole control of the measuring system such as positioning of the sample.
公开/授权文献
- US20040100280A1 Noncontact measuring system for electrical conductivity 公开/授权日:2004-05-27
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