发明授权
US06879374B2 Device manufacturing method, device manufactured thereby and a mask for use in the method
有权
装置制造方法，由此制造的装置和用于该方法的掩模
- 专利标题： Device manufacturing method, device manufactured thereby and a mask for use in the method
- 专利标题（中）： 装置制造方法，由此制造的装置和用于该方法的掩模
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申请号： US10173559申请日： 2002-06-18
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公开(公告)号： US06879374B2公开(公告)日： 2005-04-12
- 发明人: Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
- 申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop LLP
- 优先权： EP01305341 20010620
- 主分类号： G03F1/16
- IPC分类号： G03F1/16 ; G03F7/20 ; H01L21/027 ; G03B27/68 ; G03B27/42 ; G03C5/00 ; G03F9/00
摘要：
A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
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