- 专利标题： Reflection type liquid crystal display device and manufacturing method thereof
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申请号： US10051709申请日： 2002-01-18
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公开(公告)号： US06882388B2公开(公告)日： 2005-04-19
- 发明人: Norio Sugiura , Katsufumi Ohmuro , Yoshio Koike , Kunihiro Tashiro , Takeshi Gotoh , Tetsuya Hamada , Keiji Hayashi , Toshihiro Suzuki , Tetsuya Kobayashi , Kimiaki Nakamura , Mari Sugawara
- 申请人： Norio Sugiura , Katsufumi Ohmuro , Yoshio Koike , Kunihiro Tashiro , Takeshi Gotoh , Tetsuya Hamada , Keiji Hayashi , Toshihiro Suzuki , Tetsuya Kobayashi , Kimiaki Nakamura , Mari Sugawara
- 申请人地址： JP Kawasaki
- 专利权人： Fujitsu Display Technologies Corporation
- 当前专利权人： Fujitsu Display Technologies Corporation
- 当前专利权人地址： JP Kawasaki
- 代理机构： Greer, Burns & Crain, LTD
- 优先权： JP2001-016882 20010125; JP2001-101755 20010330
- 主分类号： G02F1/1335
- IPC分类号： G02F1/1335 ; G02F1/13357
摘要：
The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.
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