发明授权
- 专利标题: Ceramic substrate for manufacture/inspection of semiconductor
- 专利标题(中): 用于半导体制造/检验的陶瓷基板
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申请号: US09926464申请日: 2001-03-07
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公开(公告)号: US06888236B2公开(公告)日: 2005-05-03
- 发明人: Yasuji Hiramatsu , Yasutaka Ito , Atsushi Ozaki
- 申请人: Yasuji Hiramatsu , Yasutaka Ito , Atsushi Ozaki
- 申请人地址: JP Ogaki
- 专利权人: Ibiden Co., Ltd.
- 当前专利权人: Ibiden Co., Ltd.
- 当前专利权人地址: JP Ogaki
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2000-061901 20000307
- 国际申请: PCTJP01/01787 WO 20010307
- 国际公布: WO0166488 WO 20010913
- 主分类号: C04B35/581
- IPC分类号: C04B35/581 ; C04B35/64 ; H01L23/15 ; H01L23/053 ; C22C29/02 ; H01B3/12 ; H01L29/40
摘要:
A ceramic substrate for a semiconductor producing/examining device which has high fracture toughness value, excellent thermal shock resistivity, high thermal conductivity and an excellent temperature rising and falling properties, can be used as a hot plate, an electrostatic chuck, a wafer prober and the like. A ceramic substrate, for a semiconductor producing/examining device, having a conductor formed inside or on the surface thereof has been sintered such that a fractured section thereof exhibits intergranular fracture.