发明授权
- 专利标题: Vacuum apparatus
- 专利标题(中): 真空装置
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申请号: US10817938申请日: 2004-04-06
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公开(公告)号: US06896490B2公开(公告)日: 2005-05-24
- 发明人: Tadahiro Ohmi , Masaki Hirayama
- 申请人: Tadahiro Ohmi , Masaki Hirayama
- 申请人地址: JP Sendai JP Tokyo
- 专利权人: Tadahiro Ohmi,Tokyo Electron Limited
- 当前专利权人: Tadahiro Ohmi,Tokyo Electron Limited
- 当前专利权人地址: JP Sendai JP Tokyo
- 代理机构: Pillsbury Winthrop LLP
- 主分类号: F04D19/04
- IPC分类号: F04D19/04 ; F04D25/00 ; F04B5/00
摘要:
The present invention provides a vacuum apparatus that includes a plurality of vacuum containers each having a gas inlet and an exhaust outlet, a gas supply system for introducing a desired gas into each of the vacuum containers through the gas inlet, and an exhaust system for keeping each of the vacuum containers at a low pressure. In this vacuum apparatus, the exhaust system includes a plurality of multistage vacuum pumps connected in series. The exhaust outlet pressure of the last-stage vacuum pump is substantially at atmospheric pressure. The last-stage vacuum pump is designed to exhaust gas from a plurality of vacuum pumps at previous stages.
公开/授权文献
- US20040191079A1 Vacuum apparatus 公开/授权日:2004-09-30
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