发明授权
- 专利标题： Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information
- 专利标题（中）： 用于控制包含前馈叠加信息的光刻重叠配准的方法和装置
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申请号： US10778411申请日： 2004-02-13
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公开(公告)号： US06897075B2公开(公告)日： 2005-05-24
- 发明人: Christopher A. Bode , Alexander J. Pasadyn
- 申请人： Christopher A. Bode , Alexander J. Pasadyn
- 申请人地址： US TX Austin
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US TX Austin
- 代理机构： Williams, Morgan & Amerson
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; G01R21/26
摘要：
A method for controlling a photolithography process includes forming a first layer on a selected wafer. A first overlay error associated with the first layer is measured. At least one parameter in an operating recipe for performing a photolithography process on a second layer formed on the first wafer is determined based on at least the first overlay error measurement. A processing line includes a photolithography stepper, and overlay metrology tool, and a controller. The photolithography stepper is configured to process wafers in accordance with an operating recipe. The overlay metrology tool is configured to measure overlay errors associated with the processing of the wafers in the photolithography stepper. The controller is configured to receive a first overlay error measurement associated with the formation of a first layer on a selected wafer and determine at least one parameter in the operating recipe for performing a photolithography process on a second layer formed on the selected wafer based on at least the first overlay error measurement.
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