Invention Grant
- Patent Title: Microlithography reduction objective and projection exposure apparatus
- Patent Title (中): 微光学削减物镜和投影曝光装置
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Application No.: US10603368Application Date: 2003-06-25
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Publication No.: US06902283B2Publication Date: 2005-06-07
- Inventor: Udo Dinger
- Applicant: Udo Dinger
- Applicant Address: DE Ulm
- Assignee: Carl-Zeiss-Stiftung
- Current Assignee: Carl-Zeiss-Stiftung
- Current Assignee Address: DE Ulm
- Agency: Marshall, Gerstein & Borun LLP
- Priority: DE19906001 19990215; DE19948240 19991007
- Main IPC: G02B17/06
- IPC: G02B17/06 ; G03F7/20 ; G02B5/10

Abstract:
A projection objective formed from six mirrors arranged in a light path between an object plane and an image plane is provided. The projection objective, in some examples, is characterized by having a physical distance between the vertexes of adjacent mirrors that is large enough to allow for the six mirrors to have sufficient thickness and stability properties to prevent surface deformations due to high layer tensions. In some embodiments, mirror thickness are such that surface deformations are prevented with mirrors having layer tensions lower than 350 MPa. Mirror surfaces may comprise multilayer systems of Mo/Be or Mo/Si layer pairs. In some examples, the physical distance between a vertex of the third mirror and a vertex of the sixth mirror (S3S6) satisfies the following relationship: 0.3×(a used diameter of the third mirror S3+a used diameter of the sixth mirror S6)
Public/Granted literature
- US20040057134A1 Microlithography reduction objective and projection exposure apparatus Public/Granted day:2004-03-25
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