发明授权
US06910907B2 Contact for use in an integrated circuit and a method of manufacture therefor 失效
用于集成电路的接触及其制造方法

Contact for use in an integrated circuit and a method of manufacture therefor
摘要:
The present invention provides a contact for use in an integrated circuit, a method of manufacture therefor, and an integrated circuit including the aforementioned contact. The contact, in accordance with the principles of the present invention, may include a via located in a substrate, and a contact plug located in the via, wherein the contact plug has a first portion having a notch removed therefrom and a second portion filling the notch.
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