发明授权
- 专利标题： Processes for the preparation of fluorinated acyl fluorides and fluorinated vinyl ethers
- 专利标题（中）： 氟化氟化物和氟化乙烯基醚的制备方法
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申请号： US10727610申请日： 2003-12-05
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公开(公告)号： US06919480B2公开(公告)日： 2005-07-19
- 发明人: Takashi Okazoe , Kunio Watanabe , Masahiro Ito , Daisuke Shirakawa , Shin Tatematsu
- 申请人： Takashi Okazoe , Kunio Watanabe , Masahiro Ito , Daisuke Shirakawa , Shin Tatematsu
- 申请人地址： JP Tokyo
- 专利权人： Asahi Glass Company, Limited
- 当前专利权人： Asahi Glass Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2000-229521 20000728
- 主分类号： C07C41/48
- IPC分类号： C07C41/48 ; C07C43/313 ; C07C51/58 ; C07D317/42 ; C08F16/24 ; C08F24/00 ; C07C51/62
摘要：
The present invention provides novel processes for preparing a fluorinated acyl fluoride and a fluorinated vinyl ether.Namely, it provides a process for preparing a fluorinated acyl fluoride (3), which comprises reacting a compound (1) having a fluorine content of 30 mass % or above with fluorine in a liquid phase to form a compound (2) and then dissociating the ester bond in the compound (2), and a process for preparing a fluorinated vinyl ether (10), which comprises pyrolyzing the fluorinated acyl fluoride: wherein RA and RB are alkyl groups or the like, or the combination RA and RB is an ethereal oxygen-containing alkylene group or the like, RC and RD are perfluoro(ethereal oxygen-containing alkyl) groups or the like, or the combination of RC and RD is a perfluoro(ethereal oxygen-containing alkylene) group or the like, X1, X2, X3, X4, X5 and X6 are hydrogen atoms, fluorine atoms or the like, RAF, RBF, RCF and RDF are groups derived respectively from RA, RB, RC and RD by replacing substantially all of the hydrogen atoms by fluorine atoms.