Invention Grant
- Patent Title: Mold for nano imprinting
- Patent Title (中): 纳米压印模具
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Application No.: US10181487Application Date: 2001-01-19
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Publication No.: US06923930B2Publication Date: 2005-08-02
- Inventor: Torbjörn Ling , Lars Montelius , Babak Heidari
- Applicant: Torbjörn Ling , Lars Montelius , Babak Heidari
- Applicant Address: SE Malmo
- Assignee: Obducat Aktiebolag
- Current Assignee: Obducat Aktiebolag
- Current Assignee Address: SE Malmo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: SE0000173 20000121
- International Application: PCT/SE01/00087 WO 20010119
- International Announcement: WO01/53889 WO 20010726
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C33/66 ; B81C1/00
Abstract:
A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.
Public/Granted literature
- US20030127580A1 Mold for nano imprinting Public/Granted day:2003-07-10
Information query
