Invention Grant
- Patent Title: Process and configuration of multilayer protruding embroidery
- Patent Title (中): 多层突出绣花的工艺和配置
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Application No.: US10843344Application Date: 2004-05-12
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Publication No.: US06925947B2Publication Date: 2005-08-09
- Inventor: Chien-Lu Lin , Ming-Chin Chou
- Applicant: Chien-Lu Lin , Ming-Chin Chou
- Agency: Bacon & Thomas PLLC
- Priority: CN092113268 20030514
- Main IPC: D05C17/00
- IPC: D05C17/00 ; D05C17/02

Abstract:
A multilayer protruding embroidery process including the steps of laying and affixing a first filler on an embroidery background element; entirely wrapping up an embroidery portion of the first filler and the embroidering background element with a plurality of first sewing threads. Laying and affixing a second filler on the first and entirely wrapping up an embroidery portion including a side periphery of the second filler and background with a plurality of second embroidery threads. Fully cutting off and removing the leftover of the second embroidery portion and the first embroidery portion respectively, wherein said second portion is and outer portion of the second filler surrounding said embroidery portion, and the first embroidery portion is an outer portion of the first filler surrounding the first embroidery portion and thus a multilayer protruding embroidery is produced.
Public/Granted literature
- US20040226497A1 Process and configuration of multilayer protruding embroidery Public/Granted day:2004-11-18
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