发明授权
- 专利标题： Illumination system that suppresses debris from a light source
- 专利标题（中）： 抑制光源碎片的照明系统
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申请号： US10216547申请日： 2002-08-09
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公开(公告)号： US06927403B2公开(公告)日： 2005-08-09
- 发明人: Wolfgang Singer , Martin Antoni , Johannes Wangler , Wilhelm Egle , Vadim Yevgenyevich Banine , Erik Roelof Loopstra
- 申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Wilhelm Egle , Vadim Yevgenyevich Banine , Erik Roelof Loopstra
- 申请人地址： DE Oberkochen NL Veldhoven
- 专利权人： Carl Zeiss SMT AG,ASML Lithography B.V.
- 当前专利权人： Carl Zeiss SMT AG,ASML Lithography B.V.
- 当前专利权人地址： DE Oberkochen NL Veldhoven
- 代理机构： Ohlandt, Greeley, Ruggiero & Perle, LLP
- 优先权： DE10138284 20010810
- 主分类号： G02B5/08
- IPC分类号： G02B5/08 ; G02B5/10 ; G02B17/00 ; G02B27/18 ; G03F7/20 ; H01L21/027 ; G01N21/64
摘要：
There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.
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