发明授权
- 专利标题: Multi beam charged particle device
- 专利标题(中): 多光束带电粒子装置
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申请号: US10258869申请日: 2001-04-27
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公开(公告)号: US06943349B2公开(公告)日: 2005-09-13
- 发明人: Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
- 申请人: Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
- 申请人地址: DE Heimstetten
- 专利权人: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- 当前专利权人: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- 当前专利权人地址: DE Heimstetten
- 代理机构: Sughrue Mion, PLLC
- 优先权: EP00108973 20000427
- 国际申请: PCT/EP01/04787 WO 20010427
- 国际公布: WO01/84592 WO 20011108
- 主分类号: G01Q30/02
- IPC分类号: G01Q30/02 ; H01J37/04 ; H01J37/09 ; H01J37/26 ; G21K1/08 ; G01N23/00 ; H01J3/14 ; H01J37/28
摘要:
The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.
公开/授权文献
- US20030168606A1 Multi beam charged particle device 公开/授权日:2003-09-11
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