发明授权
- 专利标题： Method and system for fabricating optical film using an exposure source and reflecting surface
- 专利标题（中）： 使用曝光源和反射面制造光学膜的方法和系统
-
申请号： US10242564申请日： 2002-09-12
-
公开(公告)号： US06943930B2公开(公告)日： 2005-09-13
- 发明人: Xiang-Dong Mi , David Kessler , Rongguang Liang , Tomohiro Ishikawa
- 申请人： Xiang-Dong Mi , David Kessler , Rongguang Liang , Tomohiro Ishikawa
- 申请人地址： US NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： US NY Rochester
- 代理商 Nelson Adrian Blish
- 主分类号： G02B5/30
- IPC分类号： G02B5/30 ; C08G73/10 ; G02B1/10 ; G02F1/1337 ; G02F1/03
摘要：
An exposure system (5) for fabricating optical film (40) such as for photoalignment, where the optical film (40) has a photosensitive layer (20) and a substrate (10). The exposure system (5) directs an exposure beam from a light source (1) through the optical film (40), then uses a reflective surface (58) to reflect the exposure energy back through the optical film (40) to enhance or otherwise further condition the photoreaction of the photosensitive layer (20).
公开/授权文献
信息查询
