Invention Grant
- Patent Title: Electron beam device with spacer
- Patent Title (中): 带间隔器的电子束装置
-
Application No.: US10173603Application Date: 2002-06-19
-
Publication No.: US06946786B2Publication Date: 2005-09-20
- Inventor: Yoichi Ando
- Applicant: Yoichi Ando
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP11-020284 19990128
- Main IPC: H01J29/02
- IPC: H01J29/02 ; H01J29/86 ; H01J31/12 ; H01J1/62

Abstract:
An electron beam device comprising an electron source having an electron-emitting device, a member to be irradiated with an electron beam disposed opposite to the electron source, and an electrically conductive spacer disposed between the electron source and the member to be irradiated with the electron beam, is characterized in that an electrode is disposed along an end portion of the spacer on the electron source side, and the electrode is disposed inside a region of a surface of the end portion of the spacer which is directed toward the electron source side.
Public/Granted literature
- US20020158571A1 Electron beam device Public/Granted day:2002-10-31
Information query