发明授权
- 专利标题: Method of scattering fine particles, method of manufacturing liquid crystal display, apparatus for scattering fine particles, and liquid crystal display
- 专利标题(中): 散射细颗粒的方法,制造液晶显示器的方法,散射微粒的装置和液晶显示器
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申请号: US10824425申请日: 2004-04-15
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公开(公告)号: US06961112B2公开(公告)日: 2005-11-01
- 发明人: Kazuya Yoshimura , Makoto Nakahara , Takatoshi Kira , Daisuke Ikesugi , Akihiko Tateno , Hiroyuki Nakatani , Masaki Ban , Hiroshi Murata , Masaaki Kubo
- 申请人: Kazuya Yoshimura , Makoto Nakahara , Takatoshi Kira , Daisuke Ikesugi , Akihiko Tateno , Hiroyuki Nakatani , Masaki Ban , Hiroshi Murata , Masaaki Kubo
- 申请人地址: JP Osaka JP Osaka
- 专利权人: Sekisui Chemical Co., Ltd.,Sharp Kabushiki Kaisha
- 当前专利权人: Sekisui Chemical Co., Ltd.,Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka JP Osaka
- 代理机构: Connolly, Bove, Lodge & Hutz, LLP
- 优先权: JP10/50748 19980303; JP10/85401 19980331; JP10/86620 19980331; JP10/317722 19981109; JP10/356738 19981215
- 主分类号: G02F1/1339
- IPC分类号: G02F1/1339 ; G02F1/13
摘要:
The present invention has its object to provide a method of spraying particles by which predetermined quantities of particles can be disposed on specified electrodes, in particular a method of spraying particles by which spacers can be sprayed in interelectrode gaps selectively even in the case of substrates comprising pattern-forming transparent electrodes, such as those used in liquid crystal display devices, and a method of producing liquid crystal display devices of high contrast and high display uniformity by which spacers can be disposed in interelectrode gaps without sacrificing the aperture ratio and by which spacers can be disposed on the substrate without irregularity to attain a uniform cell thickness over the whole substrate, as well as a particle spraying apparatus and a liquid crystal display device.The present invention provides a method of spraying particles which comprises applying a voltage of the same polarity as the particle charge polarity to a plurality of electrodes formed on a substrate and spraying the particles while utilizing the repulsive force operating on the particles, wherein means is employed for preventing the particles from being forced out of the electrode domain comprising the plurality of electrodes.
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