发明授权
- 专利标题: Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
- 专利标题(中): 用于改善至少两个光学元件的成像特性和光刻制造方法的方法
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申请号: US10709098申请日: 2004-04-13
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公开(公告)号: US06963449B2公开(公告)日: 2005-11-08
- 发明人: Birgit Mecking , Toralf Gruner , Alexander Kohl
- 申请人: Birgit Mecking , Toralf Gruner , Alexander Kohl
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Factor & Lake, Ltd.
- 优先权: DE10162796 20011220
- 主分类号: G02B7/00
- IPC分类号: G02B7/00 ; G02B5/30 ; G03F7/20 ; H01L21/027 ; G02B27/28 ; G03B27/42 ; G03B27/72
摘要:
A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |