发明授权
- 专利标题: Pentablock copolymer and manufacturing method of the same
- 专利标题(中): 五嵌段共聚物及其制备方法相同
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申请号: US10624251申请日: 2003-07-22
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公开(公告)号: US06964996B1公开(公告)日: 2005-11-15
- 发明人: Kwanyoung Lee , Young Jin Kim , Jong Kim
- 申请人: Kwanyoung Lee , Young Jin Kim , Jong Kim
- 申请人地址: KR Seoul
- 专利权人: Korea Kumho Petrochemical Co., Ltd.
- 当前专利权人: Korea Kumho Petrochemical Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Squire, Sanders & Dempsey LLP
- 优先权: KR10-2002-0061654 20021010
- 主分类号: C08F293/00
- IPC分类号: C08F293/00 ; C08F297/04 ; C08L53/02
摘要:
The present invention relates to a ternary copolymer represented by the following formula (1) of the penta-block structure, wherein the molecular weight is 50, 000 to 400,000, pB is more than 70% of 1,4 structure, the content of pS is in range of 5% to 50%, and pB and pI are in a weight ratio of pB/pI≧1. pS-pI-pB-pI-pS (1) Wherein, pS is vinyl aromatic polymer, pB is polybutadiene and pI is polyisoprene.The block copolymer in the present invention with the structure, in which polyisoprene block is inserted between vinyl aromatic polymer block and polybutadiene block, has high mechanical properties such as tensile strength. The manufacturing method of the ternary block copolymer with penta-block structure is also provided.
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