发明授权
US06967341B2 Method and device for the generation of far ultraviolet or soft x-ray radiation
有权
用于产生远紫外或软X射线辐射的方法和装置
- 专利标题： Method and device for the generation of far ultraviolet or soft x-ray radiation
- 专利标题（中）： 用于产生远紫外或软X射线辐射的方法和装置
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申请号： US10473906申请日： 2002-03-21
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公开(公告)号： US06967341B2公开(公告)日： 2005-11-22
- 发明人: Willi Neff , Klaus Bergmann , Oliver Rosier , Joseph Pankert
- 申请人： Willi Neff , Klaus Bergmann , Oliver Rosier , Joseph Pankert
- 申请人地址： DE München DE Hamburg NL Eindhoven
- 专利权人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.,Philips Corporate Intellectual Property GmbH,Koninklijke Philips Electronics N.V.
- 当前专利权人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.,Philips Corporate Intellectual Property GmbH,Koninklijke Philips Electronics N.V.
- 当前专利权人地址： DE München DE Hamburg NL Eindhoven
- 代理商 Gudrun E. Huckett
- 优先权： DE10117378 20010406; DE10134033 20010712
- 国际申请： PCT/DE02/01017 WO 20020321
- 国际公布： WO02/082871 WO 20021017
- 主分类号： G21K1/00
- IPC分类号： G21K1/00 ; G03F7/20 ; G21K5/02 ; G21K5/08 ; H05G2/00 ; H05H1/24
摘要：
In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.