发明授权
- 专利标题: Method and apparatus for inspection by pattern comparison
- 专利标题(中): 通过模式比较检查的方法和装置
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申请号: US09861084申请日: 2001-05-18
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公开(公告)号: US06973208B2公开(公告)日: 2005-12-06
- 发明人: Masayuki Kuwabara
- 申请人: Masayuki Kuwabara
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Seimitsu Co., Ltd.
- 当前专利权人: Tokyo Seimitsu Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Christie, Parker and Hale, LLP
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G06T7/00 ; G06K9/00
摘要:
Disclosed are a method and apparatus for inspection by pattern comparison enabling cell-cell comparison by software processing even when the array pitch R of the cells is not a whole multiple of the pixel pitch P, wherein provision is made of an imaging device for capturing an image of patterns having a plurality of basic patterns repeating at a predetermined pitch and generating pixel data, a memory for storing the image data, and an image processor unit for successively comparing corresponding pixel data of the basic patterns based on the pixel data, the image processor unit setting a first whole number by which the length of the predetermined pitch multiplied by the first whole number becomes a whole multiple of the pixel pitch when the predetermined pitch is expressed by a resolution of at least a predetermined resolution pitch smaller than the pixel pitch and successively comparing the corresponding pixel data of basic patterns said first whole number of pattern away.