Invention Grant
- Patent Title: Lateral shift measurement using an optical technique
- Patent Title (中): 使用光学技术的侧向位移测量
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Application No.: US10257544Application Date: 2001-09-20
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Publication No.: US06974962B2Publication Date: 2005-12-13
- Inventor: Boaz Brill , Moshe Finarov , David Scheiner
- Applicant: Boaz Brill , Moshe Finarov , David Scheiner
- Applicant Address: IL Rehovot
- Assignee: Nova Measuring Instruments Ltd.
- Current Assignee: Nova Measuring Instruments Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Browdy and Neimark, PLLC
- Priority: IL138552 20000919
- International Application: PCT/IL01/00884 WO 20010920
- International Announcement: WO02/25723 WO 20020328
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01N21/86
Abstract:
The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.
Public/Granted literature
- US20030190793A1 Lateral shift measurement using an optical technique Public/Granted day:2003-10-09
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