Disclosed is a raw material-providing device for a chemical-vapor deposition process and includes: a bubbler for vaporizing liquid raw material and providing the vaporized raw material to a deposition unit; and a raw material tank for providing liquid raw material to the bubbler, wherein the raw material tank preserves liquid raw material to be provided to the bubbler in advance and preheats the liquid raw material, and the raw material inside the raw material tank is provided to the bubbler through a plurality of hollow micro tubes, and wherein as the raw material inside the bubbler is gradually consumed, the internal pressure of the raw material tank is adjusted to change the amount of the raw material to be provided to the bubbler, thereby adjusting the amount of the raw material inside the bubbler and the vapor pressure inside the bubbler.