Invention Grant
- Patent Title: Ferroelectric element and a ferroelectric gate device using the same
- Patent Title (中): 铁电元件和使用其的铁电栅极器件
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Application No.: US11052794Application Date: 2005-02-09
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Publication No.: US06980043B2Publication Date: 2005-12-27
- Inventor: Kenji Toyoda , Takashi Ohtsuka
- Applicant: Kenji Toyoda , Takashi Ohtsuka
- Applicant Address: JP Osaka
- Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2002-313399 20020723
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L21/8246 ; H01L27/105 ; H01L29/866 ; H03K17/62

Abstract:
A ferroelectric gate device which comprises a ferroelectric capacitor (1), a switching element (2) serving as a resistor or a capacitor depending on the voltage applied, and a field-effect transistor (6) having a source, a drain and a gate, said ferroelectric capacitor (1) having an input terminal (IN) at one end, the other end of said ferroelectric capacitor (1) being connected to one end of said switching element (2), the other end of said switching element (2) being connected to the gate of said field-effect transistor (6), by applying a voltage to said input terminal, said switching element (2) serving as a resistor when a voltage higher than the coercive voltage (Vc) of a ferroelectric substance which said ferroelectric capacitor (1) comprises is applied to said ferroelectric capacitor (1), and by applying a voltage to said input terminal, said switching element (2) serving as a capacitor when a voltage lower than the coercive voltage (Vc) of said ferroelectric substance is applied to said ferroelectric capacitor (1).
Public/Granted literature
- US20050146917A1 Ferroelectric element and a ferroelectric gate device using the same Public/Granted day:2005-07-07
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