发明授权
- 专利标题： Processing apparatus, measuring apparatus, and device manufacturing method
- 专利标题（中）： 处理装置，测量装置和装置制造方法
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申请号： US10619506申请日： 2003-07-16
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公开(公告)号： US06984362B2公开(公告)日： 2006-01-10
- 发明人: Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
- 申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP10-060591 19980225; JP10-060708 19980225; JP10-060723 19980225; JP11-015102 19990125
- 主分类号： G05B1/00
- IPC分类号： G05B1/00 ; G05B23/00
摘要：
A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
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