发明授权
US06984840B2 Optical semiconductor device having an epitaxial layer of III-V compound semiconductor material containing N as a group V element 有权
具有含有N作为V族元素的III-V族化合物半导体材料外延层的光学半导体器件

Optical semiconductor device having an epitaxial layer of III-V compound semiconductor material containing N as a group V element
摘要:
An optical semiconductor device includes an SiC substrate having an n-type conductivity, and an AlGaN buffer layer having an n-type conductivity formed on the SiC substrate with a composition represented as AlxGa1-xN, wherein the AlGaN buffer layer has a carrier density in the range between 3×1018–1×1020 cm−3, and the compositional parameter x is larger than 0 but smaller than 0.4 (0
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