- 专利标题: Electron beam recorder and method thereof
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申请号: US10174952申请日: 2002-06-20
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公开(公告)号: US06985425B2公开(公告)日: 2006-01-10
- 发明人: Masahiko Tsukuda , Kazuhiro Hayashi , Fumiaki Ueno
- 申请人: Masahiko Tsukuda , Kazuhiro Hayashi , Fumiaki Ueno
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2001-189230 20010622
- 主分类号: G11B9/00
- IPC分类号: G11B9/00
摘要:
Pits are exposed and formed on a resist master disc by an electron beam recorder. A leading end and a trailing end of each pit are substantially the same form. The electron beam recorder includes: an electron beam source that discharges electron beams; a voltage controller that generates voltages based on a predetermined information signals; control electrodes that deflect the electron beams based on the voltages; a shield plate having a passing position to pass the electron beams and a shielding position to shield the electron beams; and a turntable that carries and rotates the disc. The voltage controller controls the voltages applied to the control electrodes to substantially equalize a first velocity of the electron beams to travel from a first shielding position to the passing position with a second velocity of the electron beams to travel from the passing position to a second shielding position.
公开/授权文献
- US20030007444A1 Electron beam recorder and method thereof 公开/授权日:2003-01-09
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