- 专利标题: Substrate for electrooptic device and method of manufacturing the same, electrooptic device, and electronic equipment
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申请号: US10321286申请日: 2002-12-17
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公开(公告)号: US06987596B2公开(公告)日: 2006-01-17
- 发明人: Yoshihiro Otagiri , Keiji Takizawa , Tomoyuki Nakano , Hideki Kaneko , Chihiro Tanaka
- 申请人: Yoshihiro Otagiri , Keiji Takizawa , Tomoyuki Nakano , Hideki Kaneko , Chihiro Tanaka
- 申请人地址: JP
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2001-383023 20011217; JP2002-303217 20021017
- 主分类号: G02F1/00
- IPC分类号: G02F1/00
摘要:
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
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