发明授权
- 专利标题: Method of producing fluorine-containing synthetic quartz glass
- 专利标题(中): 含氟合成石英玻璃的制造方法
-
申请号: US09789744申请日: 2001-02-22
-
公开(公告)号: US06990836B2公开(公告)日: 2006-01-31
- 发明人: Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
- 申请人: Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Millen, White, Zelano, Branigan, P.C.
- 优先权: JP2000-045657 20000223
- 主分类号: C03B20/00
- IPC分类号: C03B20/00
摘要:
Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.
公开/授权文献
信息查询