发明授权
- 专利标题： Method for manufacturing liquid discharge head, substrate for liquid discharge head and method for working substrate
- 专利标题（中）： 液体排出头的制造方法，液体排出头用基板和工作基板的方法
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申请号： US10989282申请日： 2004-11-17
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公开(公告)号： US07001010B2公开(公告)日： 2006-02-21
- 发明人: Shuji Koyama , Teruo Ozaki , Shingo Nagata
- 申请人： Shuji Koyama , Teruo Ozaki , Shingo Nagata
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2001/244235 20020810
- 主分类号： B41J2/14
- IPC分类号： B41J2/14 ; B41J2/05
摘要：
An ink supply port is opened in an Si substrate on which an ink discharge energy generating element is formed, by anisotropic etching, from a back surface opposite to a surface on which the ink discharge energy generating element is formed. When the anisotropic etching is effected, OSF (oxidation induced laminate defect) is remained on the back surface of the Si substrate with OSF density equal to or greater than 2×104 parts/cm2 and a length of OSF equal to or greater than 2 μm.