发明授权
- 专利标题： Method of manufacturing a magnetic tunnel junction device
- 专利标题（中）： 制造磁性隧道结装置的方法
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申请号： US09787457申请日： 2000-07-17
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公开(公告)号： US07001777B1公开(公告)日： 2006-02-21
- 发明人: Derk Jan Adelerhof , Reinder Coehoorn , Joannes Baptist Adrianus Dionisius Van Zon
- 申请人： Derk Jan Adelerhof , Reinder Coehoorn , Joannes Baptist Adrianus Dionisius Van Zon
- 申请人地址： NL Eindhoven
- 专利权人： Koninklijke Philips Electronics N.V.
- 当前专利权人： Koninklijke Philips Electronics N.V.
- 当前专利权人地址： NL Eindhoven
- 国际申请： PCT/EP00/06816 WO 20000717
- 国际公布： WO01/07926 WO 20010201
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A method of manufacturing a magnetic tunnel junction device, in which a stack (1) comprising two magnetic layers (3, 7) and a barrier layer (5) extending in between is formed. One of the magnetic layers is structured by means of etching, in which, during etching, a part of this layer is made thinner by removing material until a rest layer (7r) remains. This rest layer is passivated by chemical conversion. In the relevant method, it is prevented that the magnetic layer which is not to be structured is detrimentally influenced during structuring of the other magnetic layer.
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