发明授权
- 专利标题： Reticle focus measurement system using multiple interferometric beams
- 专利标题（中）： 光栅聚焦测量系统使用多个干涉光束
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申请号： US10965026申请日： 2004-10-15
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公开(公告)号： US07016051B2公开(公告)日： 2006-03-21
- 发明人: Stephen Roux , Todd J. Bednarek
- 申请人： Stephen Roux , Todd J. Bednarek
- 申请人地址： NL Veldhoven
- 专利权人： ASML Holding N.V.
- 当前专利权人： ASML Holding N.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G01B9/02
- IPC分类号： G01B9/02
摘要：
A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.
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