发明授权
- 专利标题： Mesoporous silica, process for the preparation of the same, and use thereof
- 专利标题（中）： 介孔二氧化硅，其制备方法及其用途
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申请号： US09555073申请日： 1998-11-19
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公开(公告)号： US07018596B2公开(公告)日： 2006-03-28
- 发明人: Seiji Satou , Tadashi Shimizu
- 申请人： Seiji Satou , Tadashi Shimizu
- 申请人地址： JP Osaka
- 专利权人： Asahi Kasei Kabushiki Kaisha
- 当前专利权人： Asahi Kasei Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 代理机构： Dickstein, Shaprio, Morin & Oshinsky, LLP.
- 优先权： JP9-320801 19971121
- 国际申请： PCT/JP98/05223 WO 19981119
- 国际公布： WO99/26881 WO 19990603
- 主分类号： C01B37/02
- IPC分类号： C01B37/02 ; B41M5/00
摘要：
Accordingly, the invention provides: (1) mesoporous silica characterized by having an average pore diameter in the mesopore region of from 1.5 to 10 nm, a nitrogen adsorption specific surface area determined by the BET method of from 500 to 1400 m2/g, and a monolayer adsorption of water at 25° C. of 1.7 H2O molecules/nm2 specific surface area or more; (2) a process for synthesizing the mesoporous silica characterized by mixing and reacting active silica with a neutral template and removing the neutral template from the thus formed complex; (3) ink absorbents characterized by containing mesoporous silica; (4) ink absorbent slurries composed of the above-described ink absorbent and a solvent; and (5) recording sheets characterized by containing the above-described ink absorbent.